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Antoine Legrain
Antoine Legrain
Postdoctoral fellow, LTM, CNRS, Grenoble
Verified email at cea.fr
Title
Cited by
Cited by
Year
Ultrafast Assembly of PS‐PDMS Block Copolymers on 300 mm Wafers by Blending with Plasticizers
J Arias‐Zapata, S Böhme, J Garnier, C Girardot, A Legrain, M Zelsmann
Advanced Functional Materials 26 (31), 5690-5700, 2016
282016
Controllable elastocapillary folding of three-dimensional micro-objects by through-wafer filling
A Legrain, TG Janson, JW Berenschot, L Abelmann, NR Tas
Journal of Applied Physics 115 (21), 2014
252014
Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line–Space Patterning
A Legrain, G Fleury, M Mumtaz, C Navarro, J Arias-Zapata, X Chevalier, ...
ACS applied materials & interfaces 9 (49), 43043-43050, 2017
222017
Engineering self-assembly of a high-χ block copolymer for large-area fabrication of transistors based on functional graphene nanoribbon arrays
J Arias-Zapata, JD Garnier, HA Mehedi, A Legrain, B Salem, G Cunge, ...
Chemistry of Materials 31 (9), 3154-3162, 2019
182019
Capillary origami of micro-machined micro-objects: Bi-layer conductive hinges
A Legrain, JW Berenschot, NR Tas, L Abelmann
Microelectronic engineering 140, 60-66, 2015
132015
Let's twist again: elasto-capillary assembly of parallel ribbons
A Legrain, EJW Berenschot, L Abelmann, J Bico, NR Tas
Soft matter 12 (34), 7186-7194, 2016
112016
Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning
C Navarro, C Nicolet, F Ariura, X Chevalier, K Xu, MA Hockey, M Mumtaz, ...
Journal of Photopolymer Science and Technology 30 (1), 69-75, 2017
62017
Micro-assembly of three dimensional tetrahedra by capillary forces
JW van Honschoten, A Legrain, JW Berenschot, L Abelmann, NR Tas
2011 IEEE 24th International Conference on Micro Electro Mechanical Systems …, 2011
62011
Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturing
S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann
Micro and Nano Engineering 1, 56-62, 2018
42018
Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
P Bézard, X Chevalier, A Legrain, C Navarro, C Nicolet, G Fleury, ...
Advanced Etch Technology for Nanopatterning VII 10589, 39-48, 2018
32018
Elasto-Capillary Folding Using Stop-Programmable Hinges Fabricated by 3D Micro-Machining
A Legrain, EJW Berenschot, NR Tas, L Abelmann
Plos one 10 (5), e0125891, 2015
32015
Elastocapillary folding of three dimensional micro-structures using water pumped through the wafer via a silicon nitride tube
ABH Legrain, JW Berenschot, RGP Sanders, K Ma, NR Tas, L Abelmann
22nd Micromechanics and Microsystems Europe Workshop, MME 2011, 250-253, 2011
12011
Micro and Nano Engineering
S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann
2018
Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
M Zelsmann, P Bézard, X Chevalier, A Legrain, C Navarro, C Nicolet, ...
SPIE Advanced Lithography 105890, 2018
2018
Block-copolymers performances improvement and design for DSA applications in microelectronic
X Chevalier, C Nicolet, G Fleury, M Zelsmann, P Bezard, A Legrain, ...
European Materials Research Society conference-E-MRS 2018, Spring Meeting, 2018
2018
Different approaches to reduce DSA defectivity by dry-etching
P Bézard, G Cunge, X Chevalier, G Lombard, A Legrain, M Zelsmann
Plasma Etch and Strip for Microtechnology workshop–PESM 2017, 2017
2017
Materials meeting electronic requirements for Sub-10 nm lithography
C Navarro, C Nicolet, X Chevalier, K Xu, MA Hockey, G Fleury, ...
Directed Self-Assembly Symposium–DSA 2017, 2017
2017
Interface optimization for high-chi block copolymers materials with sub-10 nm resolution
A Paquet, X Chevalier, A Legrain, M Zelsmann, G Fleury, C Nicolet, ...
Micro-and Nano-Engineering conference-MNE 2017, 2017
2017
Novel Si-containing high-χ block-copolymer for nanolithography application: PS-b-PDMSB
A Legrain, J Arias-Zapata, S Böhme, C Girardot, C Navarro, G Fleury, ...
Micro-and Nano-Engineering conference-MNE 2016, 2016
2016
Si-containing high- block-copolymers for nanolithography applications
A Legrain, C Girardot, X Chevalier, C Navarro, I Cayrefourcq, G Fleury, ...
Directed Self-Assembly Symposium–DSA 2016, 2016
2016
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