Theo dõi
Daniel Fan
Daniel Fan
Email được xác minh tại unimelb.edu.au
Tiêu đề
Trích dẫn bởi
Trích dẫn bởi
Năm
Engineered 3D polymer and hydrogel microenvironments for cell culture applications
D Fan, U Staufer, A Accardo
Bioengineering 6 (4), 113, 2019
792019
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
D Fan, Y Ekinci
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033505-033505, 2016
62*2016
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths
N Mojarad, D Fan, J Gobrecht, Y Ekinci
Optics Letters 39 (8), 2286-2289, 2014
482014
SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography
E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci
Microelectronic Engineering 155, 44-49, 2016
422016
Strain and thermal conductivity in ultrathin suspended silicon nanowires
D Fan, H Sigg, R Spolenak, Y Ekinci
Physical Review B 96 (11), 115307, 2017
402017
Emergent collective organization of bone cells in complex curvature fields
SJP Callens, D Fan, IAJ van Hengel, M Minneboo, PJ Díaz-Payno, ...
Nature Communications 14 (1), 855, 2023
372023
Effect of the pn junction engineering on Si microwire‐array solar cells
A Dalmau Mallorquí, FM Epple, D Fan, O Demichel, ...
physica status solidi (a) 209 (8), 1588-1591, 2012
342012
Nickel electroplating for high-resolution nanostructures
K Hili, D Fan, VA Guzenko, Y Ekinci
Microelectronic Engineering 141, 122-128, 2015
332015
3D printing of large areas of highly ordered submicron patterns for modulating cell behavior
M Nouri-Goushki, MJ Mirzaali, L Angeloni, D Fan, M Minneboo, ...
ACS applied materials & interfaces 12 (1), 200-208, 2019
282019
Fabrication of a microfluidic device by using two-photon lithography on a positive photoresist
G van der Velden, D Fan, U Staufer
Micro and Nano Engineering 7, 100054, 2020
242020
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility
D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci
Microelectronic Engineering 155, 55-60, 2016
232016
Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET
D Dutta, DS De, D Fan, S Roy, G Alfieri, M Camarda, M Amsler, ...
Applied Physics Letters 115 (10), 2019
212019
Fabrication of ultrahigh resolution metal nanowires and nanodots through EUV interference lithography
J Huang, D Fan, Y Ekinci, C Padeste
Microelectronic Engineering 141, 32-36, 2015
192015
Nanolithography using Bessel beams of extreme ultraviolet wavelength
D Fan, L Wang, Y Ekinci
Scientific reports 6 (1), 31301, 2016
162016
EUV resists towards 11nm half-pitch
Y Ekinci, M Vockenhuber, N Mojarad, D Fan
Extreme Ultraviolet (EUV) Lithography V 9048, 904804, 2014
162014
All-dielectric metasurface-based roll-angle sensor
X Chen, Z Tao, C Chen, C Wang, L Wang, H Jiang, D Fan, Y Ekinci, S Liu
Sensors and Actuators A: Physical 279, 509-517, 2018
152018
SOLEIL: single-objective lens inclined light sheet localization microscopy
ST Hung, J Cnossen, D Fan, M Siemons, D Jurriens, K Grußmayer, ...
Biomedical Optics Express 13 (6), 3275-3294, 2022
102022
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
L Wang, D Fan, VA Guzenko, Y Ekinci
Journal of Vacuum Science & Technology B 31 (6), 2013
102013
Theoretical minimum uncertainty of single-molecule localizations using a single-photon avalanche diode array
Q Houwink, D Kalisvaart, ST Hung, J Cnossen, D Fan, P Mos, AC Ülkü, ...
Optics Express 29 (24), 39920-39929, 2021
72021
From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer …
E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, JA van Bokhoven, ...
UV and Higher Energy Photonics: From Materials to Applications 9926, 59-70, 2016
62016
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