Yasin Ekinci
Cited by
Cited by
Catalyst support effects on hydrogen spillover
W Karim, C Spreafico, A Kleibert, J Gobrecht, J VandeVondele, Y Ekinci, ...
Nature 541 (7635), 68-71, 2017
Plasmon resonances of aluminum nanoparticles and nanorods
Y Ekinci, HH Solak, JF Löffler
Journal of Applied Physics 104 (8), 2008
Symmetry breaking in a plasmonic metamaterial at optical wavelength
A Christ, OJF Martin, Y Ekinci, NA Gippius, SG Tikhodeev
Nano letters 8 (8), 2171-2175, 2008
Deep-UV surface-enhanced resonance Raman scattering of adenine on aluminum nanoparticle arrays
SK Jha, Z Ahmed, M Agio, Y Ekinci, JF Löffler
Journal of the American Chemical Society 134 (4), 1966-1969, 2012
Three-dimensional Si/Ge quantum dot crystals
D Grützmacher, T Fromherz, C Dais, J Stangl, E Müller, Y Ekinci, ...
Nano letters 7 (10), 3150-3156, 2007
Controlling the Fano interference in a plasmonic lattice
A Christ, Y Ekinci, HH Solak, NA Gippius, SG Tikhodeev, OJF Martin
Physical Review B 76 (20), 201405, 2007
Sub-10 nm patterning using EUV interference lithography
B Päivänranta, A Langner, E Kirk, C David, Y Ekinci
Nanotechnology 22 (37), 375302, 2011
Bilayer Al wire-grids as broadband and high-performance polarizers
Y Ekinci, HH Solak, C David, H Sigg
Optics express 14 (6), 2323-2334, 2006
Nonlinear superchiral meta-surfaces: tuning chirality and disentangling non-reciprocity at the nanoscale
VK Valev, JJ Baumberg, B De Clercq, N Braz, X Zheng, EJ Osley, ...
Advanced Materials (Deerfield Beach, Fla.) 26 (24), 4074, 2014
Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5 nm)
B Cardineau, R Del Re, M Marnell, H Al-Mashat, M Vockenhuber, Y Ekinci, ...
Microelectronic engineering 127, 44-50, 2014
Beyond EUV lithography: a comparative study of efficient photoresists' performance
N Mojarad, J Gobrecht, Y Ekinci
Scientific reports 5 (1), 1-7, 2015
Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications
N Mojarad, J Gobrecht, Y Ekinci
Microelectronic Engineering 143, 55-63, 2015
Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond
N Mojarad, M Hojeij, L Wang, J Gobrecht, Y Ekinci
Nanoscale 7 (9), 4031-4037, 2015
Engineering metal adhesion layers that do not deteriorate plasmon resonances
T Siegfried, Y Ekinci, OJF Martin, H Sigg
ACS nano 7 (3), 2751-2757, 2013
High aspect ratio plasmonic nanostructures for sensing applications
B Päivänranta, H Merbold, R Giannini, L Büchi, S Gorelick, C David, ...
ACS nano 5 (8), 6374-6382, 2011
Photon-beam lithography reaches 12.5 nm half-pitch resolution
HH Solak, Y Ekinci, P Käser, S Park
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
Gap plasmons and near-field enhancement in closely packed sub-10 nm gap resonators
T Siegfried, Y Ekinci, OJF Martin, H Sigg
Nano letters 13 (11), 5449-5453, 2013
Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors
T Siegfried, Y Ekinci, HH Solak, OJF Martin, H Sigg
Applied Physics Letters 99 (26), 2011
Electric and magnetic resonances in arrays of coupled gold nanoparticle in-tandem pairs
Y Ekinci, A Christ, M Agio, OJF Martin, HH Solak, JF Löffler
Optics express 16 (17), 13287-13295, 2008
Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond
Y Ekinci, M Vockenhuber, M Hojeij, L Wang, N Mojarad
Extreme Ultraviolet (EUV) Lithography IV 8679, 246-256, 2013
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