| Area-selective atomic layer deposition using Si precursors as inhibitors R Khan, B Shong, BG Ko, JK Lee, H Lee, JY Park, IK Oh, SS Raya, ... Chemistry of Materials 30 (21), 7603-7610, 2018 | 104 | 2018 |
| Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 Using Ethanethiol Inhibitor HG Kim, M Kim, B Gu, MR Khan, BG Ko, S Yasmeen, CS Kim, SH Kwon, ... Chemistry of Materials 32 (20), 8921-8929, 2020 | 52 | 2020 |
| Growth modulation of atomic layer deposition of HfO 2 by combinations of H 2 O and O 3 reactants BG Ko, CT Nguyen, B Gu, MR Khan, K Park, H Oh, J Park, B Shong Dalton Transactions 50 (48), 17935-17944, 2021 | 7 | 2021 |
